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China Unveils First Homegrown Commercial Electron Beam Lithography Machine
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中国在半导体技术领域取得了重大突破,成功研发出首台国产商用电子束光刻机“曦之”。该设备由浙江大学玉航量子研究院自主开发,已进入应用测试阶段,标志着中国在量子芯片研发能力上实现了关键飞跃。 “曦之”光刻机精度可达0.6纳米,线宽8纳米,能够实现高度精密的电路刻写,媲美国际主流设备。它采用高能电子束直接在硅片上“绘制”电路,无需光掩模,在量子芯片等前沿研发的迭代过程中,能够快速灵活地调整电路设计,极大地加速了实验进程。此举也有效解决了长期以来因国际出口限制导致的设备获取难题,为中国在高端制造和科学研究领域提供了自主可控的关键技术支撑,推动了国内半导体产业链的完善和科技自立自强。

“曦之”电子束光刻机是中国首台国产商用设备,由浙江大学玉航量子研究院独立研发,标志着中国在量子芯片研发领域迈出了关键一步,其技术水平已能与国际主流设备媲美。

该光刻机拥有0.6纳米的精度和8纳米的线宽能力,能够进行高度精密的电路刻写,其“纳米笔”般的精细度可比喻为在一根头发丝上雕刻一座城市地图,为先进量子芯片的制造提供了必要条件。

与传统光刻技术不同,“曦之”采用电子束直接写入,无需成本高昂的光掩模,这使得在量子芯片的迭代开发过程中,研究人员可以快速修改电路设计,无需等待掩模制造,从而显著加速早期实验和调试过程。

“曦之”的研发和商业化成功,直接解决了中国在获取高端光刻设备方面长期面临的国际出口限制问题,填补了国内空白,并建立了完整的国产替代链条,为基础研究和量子芯片的实际生产提供了强大的本土支持。

“曦之”的成功不仅将提升中国在高端制造和科学研究领域的竞争力,其应用还可扩展至AI、光子学等前沿技术,并加强中国在全球半导体供应链中的地位,减少对外国供应商的依赖,有力地支持了国家在关键半导体工艺上的技术自主目标。

Credit: CFP

TMTPOST -- China has taken a major step forward in semiconductor technology with the development of its first domestically produced commercial electron beam lithography (EBL) machine, “Xizhi,” which has now entered the application testing phase, Hangzhou Daily reported Thursday.

The development represents a critical leap forward in China’s quantum chip research and development capabilities, providing a domestically produced precision tool on par with mainstream international equipment.

The “Xizhi” lithography machine, independently developed by Zhejiang University’s Yuhang Quantum Research Institute, is capable of achieving 0.6-nanometer accuracy and line widths of 8 nanometers, enabling highly precise circuit writing essential for advanced quantum chip fabrication. “This is not an ordinary machine; it is a ‘nano-pen’ capable of engraving an entire city map on a strand of hair,” a representative of the research team said, highlighting the machine’s extraordinary precision.

Resembling a large steel cabinet, the “Xizhi” uses a high-energy electron beam to “write” circuits directly onto silicon wafers. Unlike traditional photolithography, which requires costly photomasks, EBL allows flexible design changes—an advantage especially valuable during the iterative development phases of quantum chips. Researchers can make rapid adjustments to circuit patterns without being constrained by mask fabrication, significantly accelerating early-stage experimentation.

The machine’s development also addresses long-standing challenges posed by international export restrictions. For years, Chinese research institutions and companies, including the University of Science and Technology of China and Zhejiang Lab, faced barriers to accessing high-end lithography tools due to export controls. “The commercialization of ‘Xizhi’ not only fills this domestic gap but also establishes a complete domestic replacement chain,” the team representative noted. The machine is now positioned to support both fundamental research and applied quantum chip manufacturing in China.

Named after the celebrated Chinese calligrapher Wang Xizhi, the machine’s designation reflects the precision and delicacy of traditional calligraphy applied at the nanoscale. “Our ‘brush’ is the electron beam, which writes circuits on chips,” the representative said, emphasizing the technological artistry embedded in the design. The analogy underscores how the machine can execute highly detailed and repeatable patterns, essential for debugging and testing in quantum chip development.

The introduction of “Xizhi” is expected to enhance China’s competitiveness in high-end manufacturing and scientific research. Its applications extend beyond quantum chips to broader semiconductor R&D, potentially catalyzing advances in AI, photonics, and other frontier technologies. By providing an indigenous platform for iterative experimentation and production, the machine supports the country’s goal of technological self-reliance in critical semiconductor processes.

Experts note that the “Xizhi” machine’s launch also strengthens China’s position within the global semiconductor supply chain. With the machine entering the market, domestic manufacturers and research institutions can reduce dependency on foreign suppliers, ensuring that strategic advancements in quantum chip development remain largely in-country. The project also signals China’s commitment to converting scientific achievements into industrial productivity, a priority for national technological competitiveness.

“The testing phase of ‘Xizhi’ is a significant milestone,” said an industry expert. “It demonstrates that China can now develop, produce, and deploy high-precision lithography tools independently. This capability will be crucial in maintaining leadership in quantum chip R&D and advancing the country’s broader semiconductor ambitions.”

As China continues to invest in cutting-edge semiconductor technologies, the Xizhi electron beam lithography machine exemplifies the country’s drive toward innovation, precision manufacturing, and technological self-sufficiency. Its successful deployment may well accelerate China’s transition from scientific experimentation to industrial-scale production in quantum and advanced chip technologies, further solidifying its role in the global semiconductor industry.

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电子束光刻机 量子芯片 半导体技术 科技自立自强 国产替代
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